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The Optical MicroSystems Laboratory has ConSiM (Concordia Silicon Microfabrication) located in a claean room of 100 sq. m.
The support of $1.1M from CFI and Industrial partners is highlyly acknowledged.


The following are some of the equipments and facilities available for Microfabrication and Microlithography

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Direct Write Lithography DWL66
image Plasmalab 80 +ICP65 Deep Reactive Ion Etcher for Silicon and Oxide
image Plasma Enhanced Chemical Vapour Deposition PECVD DP80 for SiO2,Si3N4, SiON
image E-Beam Deposition
image Xenon difluoride etching facility
image TMAH etching setup
image Wirebonding
image UV lithography setup
image Edwards Sputter deposition
image Excimer Laser
image Soft-Lithography on polymers, PDMS, PMMA
image Nano synthesis
image Dimatix Materials Printer
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