Thin film silicon photovoltaics: Architectural perspectives and technological issues
Mercaldo, L. V., Addonizio, M. L., Noce, M. D., Veneri, P. D., Scognamiglio, A. and Privato, C.
2009 Applied Energy, 86(10): 1836-1844
Renewable energy; Thin film silicon photovoltaics; Building integrated photovoltaics; Micromorph solar cells
Mercaldo, L. V., Addonizio, M. L., Noce, M. D., Veneri, P. D., Scognamiglio, A. and Privato, C., (2009), "Thin film silicon photovoltaics: Architectural perspectives and technological issues", Applied Energy, 86(10): 1836-1844.
Abstract:
Thin film photovoltaics is a particularly attractive technology for building integration. In this paper, we present our analysis on architectural issues and technological developments of thin film silicon photovoltaics. In particular, we focus on our activities related to transparent and conductive oxide (TCO) and thin film amorphous and microcrystalline silicon solar cells. The research on TCO films is mainly dedicated to large-area deposition of zinc oxide (ZnO) by low pressure-metallorganic chemical vapor deposition. ZnO material, with a low sheet resistance (<8 [Omega]/sq) and with an excellent transmittance (>82%) in the whole wavelength range of photovoltaic interest, has been obtained. 'Micromorph' tandem devices, consisting of an amorphous silicon top cell and a microcrystalline silicon bottom cell, are fabricated by using the very high frequency plasma enhanced chemical vapor deposition technique. An initial efficiency of 11.1% (>10% stabilized) has been obtained.
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